▪ US Patent No. 8,298,370 (Piezonics Co., Ltd.)
발명의 명칭: Apparatus for chemical vapor deposition (CVD) with showerhead
대표도면:
대표독립항:
1. An apparatus for chemical vapor deposition (CVD) with a showerhead through which a source of material gas comprising a reactive gas of at least one kind and a purge gas are injected over a substrate located in a reaction chamber to deposit a film on the substrate, wherein the showerhead includes:
a first reactive gas showerhead module having an upper plate and a bottom plate, and defining an enclosed inner space between the upper plate and the bottom plate thereof for receiving a first kind of reactive gas therein, the first reactive gas showerhead module having a plurality of reactive gas flow channels connected thereto and extending toward the substrate for injecting the first reactive gas over the substrate;
a second reactive gas showerhead module having an upper plate and a bottom plate, and disposed below the first reactive gas showerhead module, the upper plate of the second reactive gas showerhead module being separable from the bottom plate of the first reactive gas showerhead module, the second reactive gas showerhead module defining an enclosed inner space between the upper plate and the bottom plate thereof for receiving a second kind of reactive gas therein, the second reactive gas showerhead module having a plurality of reactive gas flow channels connected thereto and extending toward the substrate for injecting the second reactive gas over the substrate, the reactive gas flow channels of the second reactive gas showerhead module disposed at locations spaced apart from where the reactive gas flow channels of the first reactive gas showerhead module are located; and
a purge gas showerhead module having an upper plate and a bottom plate, and disposed below the second reactive gas showerhead module, the upper plate of the purge gas showerhead module being separable from the bottom plate of the second reactive gas showerhead module, the purge gas showerhead module having a purge gas supply port for supplying a purge gas thereto, an enclosed inner space separated from the inner spaces of the first and second reactive gas showerhead modules for receiving the purge gas therein, a plurality of inlets formed on the upper surface thereof for allowing said reactive gas flow channels to pass thereto with hermetic sealing at joints of said inlets, a plurality of exits for said reactive gas flow channels and a plurality of exits for said purge gas formed on the bottom surface of the purge gas showerhead module to allow the injection of the reactive gases and the purge gas there-through,
wherein each reactive gas flow channel of the first reactive gas showerhead module passes through the inner space of the second reactive gas showerhead module and through the inner space of the purge gas showerhead module.
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▪ US Patent No. 8,882,913 (Piezonics Co., Ltd.)
발명의 명칭: Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof
대표도면:
대표독립항:
1. An apparatus for chemical vapor deposition (CVD) with a showerhead through which a reactive gas and a purge gas are injected over a substrate located in a reaction chamber to deposit a film on the substrate, the showerhead comprising:
a reactive gas showerhead module, equipped with a reactive gas supply port to supply the reactive gas to the inside of the reactive gas showerhead module, having a plurality of reactive gas injection tubes connected to a bottom of the reactive gas showerhead module to inject the reactive gas over the substrate through the reactive gas injection tubes;
a purge gas showerhead module, disposed below the reactive gas showerhead module, the purge gas showerhead module comprising a ceiling, a vertical wall, and a bottom plate, and equipped with a purge gas supply port to supply the purge gas to the inside of the purge gas showerhead module, the purge gas showerhead module having a plurality of guide tubes hermetically installed and extending between the ceiling and the bottom plate of the purge gas showerhead module and allowing the reactive gas injection tubes to pass through the guide tubes of the purge gas showerhead module while keeping a hermetic sealing between the purge gas showerhead module and the reactive gas injection tubes; and
a cooling jacket for cooling the showerhead, the cooling jacket mounted below the purge gas showerhead module, the cooling jacket comprising a ceiling, a vertical wall, a coolant inlet port, a coolant outlet port, and a bottom, wherein said ceiling of the cooling jacket is a different element from the bottom plate of the purge gas showerhead module, and a plurality of guide tubes hermetically installed and extending between the ceiling and the bottom of the cooling jacket, with one end of each guide tube connected to the ceiling of the cooling jacket and the other end connected to the bottom of the cooling jacket, said guide tubes aligned with the guide tubes of the purge gas showerhead module and configured to receive the reactive gas injection tubes there-through, the inner diameter of the guide tubes being larger than the outer diameter of the reactive gas injection tubes and having a gap between the guide tube and the reactive gas injection tube,
wherein the showerhead is configured such that the purge gas released from the purge gas showerhead module passes through the gap between the guide tube and the reactive gas injection tube to be injected over the substrate.
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▪ US Patent No. 8,678,212 (Sunrise Kitchen Co., Ltd.)
발명의 명칭: Container and container cover for sealing the container opening
대표도면:
대표독립항:
1. A receptacle and closure sealing system comprising:
a container comprising:
an exterior wall; and,
a rim defining an upper opening;
an adjustable closure having a sealed orientation and an unsealed orientation, said closure comprising:
a rigid lid comprising:
a top surface;
a bottom surface; and,
a flared outer edge;
an integral annular seal comprising:
an inwardly facing channel surrounding said rigid lid, allowing said rigid lid and said annular seal to be cooperatively seated upon said rim of said container, said inwardly facing channel having:
an upper portion secured to said top surface, a lower portion secured to said bottom surface, and a joint connecting said upper portion to said lower portion;
an outer annular wall having:
a first planar surface, a second planar surface opposite from said first planar surface, a distal end formed by a beaded flange, and
a proximal end formed by a flexible junction with said joint of said channel, said flexible junction allowing said outer annular wall to pivot between an upper and substantially horizontal first position to a lower and substantially vertical second position;
wherein when said adjustable closure is disposed in said unsealed orientation, said outer annular wall is oriented in said first position with said first planar surface facing said top surface of said rigid lid; and,
wherein when said adjustable closure is disposed in said sealed orientation, said outer annular wall is oriented in said second position with said second planar surface substantially sealed to an upper portion of said exterior wall of said container.
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▪ US Trademark No. 4,021,467 (Ha, Yong-ho)
상표명:
지정상품/지정서비스업:
(IC 025) G & S: Athletic footwear; track and field shoes; basketball shoes; football shoes; leather shoes; sandals; sport shirts; athletic uniforms; socks; caps